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A negatively charged ion such as the chloride ion (Cl-).
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Related Terms |
PLASMA-SOURCE ION IMPLANTATION
A method of ion implantation in which the workpiece is placed in a plasma containing the appropriate ion species and is repetitively pulse-biased to a high negative potential so that positive plasma ions are accelerated to the surface and implant in the bulk material. Abbreviated PSII.
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ION MACHINING
Use of a high-velocity ion beam to remove material from a surface. Also known as ion beam thinning, ion milling.
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ION-BEAM SCANNING
The process of analyzing the mass spectrum of an ion beam in a mass spectrometer either by changing the electric or magnetic fields of the mass spectrometer or by moving a probe.
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IMPLANTED ATOM
An atom introduced into semiconductor material by ion implantation.
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BICARBONATE
An ion or salt of carbonic acid, containing hydrogen, carbon, and oxygen (HC03), such as sodium bicarbonate, NaHC03.
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CATION
A positively charged ion that migrates through the electrolyte toward the cathode under the influence of a potential gradient.
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BED DEPTH
The height of the resinous material in the column after the ion exchanger has been properly conditioned for effective operation.
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DE-ALKALIZER
An apparatus or device used to remove the alkaline carbonate and bicarbonate ions from a water supply.
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ION EXCHANGE
A reversible process by which ions are interchanged between solids and a liquid. These ions exist throughout the solution and act almost independently.
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ION
A charge atom or radical which may be positive or negative.
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