A positively charged ion that migrates through the electrolyte toward the cathode under the influence of a potential gradient.


Related Terms

PLASMA-SOURCE ION IMPLANTATION

A method of ion implantation in which the workpiece is placed in a plasma containing the appropriate ion species and is repetitively pulse-biased to a high negative potential so that positive plasma ions are accelerated to the surface and implant in the bulk material. Abbreviated PSII.

ION MACHINING

Use of a high-velocity ion beam to remove material from a surface. Also known as ion beam thinning, ion milling.

ION-BEAM SCANNING

The process of analyzing the mass spectrum of an ion beam in a mass spectrometer either by changing the electric or magnetic fields of the mass spectrometer or by moving a probe.

IMPLANTED ATOM

An atom introduced into semiconductor material by ion implantation.

BICARBONATE

An ion or salt of carbonic acid, containing hydrogen, carbon, and oxygen (HC03), such as sodium bicarbonate, NaHC03.

BED DEPTH

The height of the resinous material in the column after the ion exchanger has been properly conditioned for effective operation.

DE-ALKALIZER

An apparatus or device used to remove the alkaline carbonate and bicarbonate ions from a water supply.

ANION

A negatively charged ion such as the chloride ion (Cl-).

ION EXCHANGE

A reversible process by which ions are interchanged between solids and a liquid. These ions exist throughout the solution and act almost independently.

ION

A charge atom or radical which may be positive or negative.

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